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Capitelli, Mario; Colonna, Gianpiero; Esposito, Fabrizio; Hassouni, Khaled; Laricchiuta, Annarita; Celiberto, Roberto; Longo, Savino; Gorse, Claudine - Fundamental Aspects of Plasma Chemical Physics - 9781441981844 - V9781441981844
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Fundamental Aspects of Plasma Chemical Physics

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Description for Fundamental Aspects of Plasma Chemical Physics Hardcover. This book examines non-equilibrium "cold" plasmas via a chemical physics approach, using state-to-state plasma kinetics, which views each internal state as a new species with its own cross-sections. Includes examples in microelectronics, fusion, and aerospace. Series: Springer Series on Atomic, Optical, and Plasma Physics. Num Pages: 318 pages, 46 black & white illustrations, 137 colour illustrations, biography. BIC Classification: PHFP; PHH; PHS; PNR. Category: (P) Professional & Vocational. Dimension: 235 x 155. .

Describing non-equilibrium "cold" plasmas through a chemical physics approach, this book uses the state-to-state plasma kinetics, which considers each internal state as a new species with its own cross sections. Extended atomic and molecular master equations are coupled with Boltzmann and Monte Carlo methods to solve the electron energy distribution function. Selected examples in different applied fields, such as microelectronics, fusion, and aerospace, are presented and discussed including the self-consistent kinetics in RF parallel plate reactors, the optimization of negative ion sources and the expansion of high enthalpy flows through nozzles of different geometries.

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Product Details

Format
Hardback
Publication date
2015
Publisher
Springer-Verlag New York Inc. United States
Number of pages
318
Condition
New
Series
Springer Series on Atomic, Optical, and Plasma Physics
Number of Pages
318
Place of Publication
New York, NY, United States
ISBN
9781441981844
SKU
V9781441981844
Shipping Time
Usually ships in 15 to 20 working days
Ref
99-15

About Capitelli, Mario; Colonna, Gianpiero; Esposito, Fabrizio; Hassouni, Khaled; Laricchiuta, Annarita; Celiberto, Roberto; Longo, Savino; Gorse, Claudine
Mario Capitelli, University of Bari, mario.capitelli@ba.imip.cnr.it Gianpiero Colonna, IMIP CNR Fabrizio Esposito, IMIP CNR Khaled Hassouni, Institut Galilee-Univeriste Paris Annarita Laricchiuta, IMIP CNR Savino Longo, University of Bari

Reviews for Fundamental Aspects of Plasma Chemical Physics
“The work will be a valuable resource for researchers using many applications involving nonequilibrium cold plasmas such as plasma beams, etching, cleaning, deposition, surface activation, and gas lasers. … Extensive references are provided, chapter-by-chapter, in addition to useful tables of reactions and processes with descriptions and references. … Summing Up: Recommended. Graduate students, researchers/faculty, and professionals/practitioners.” (T. Eastman, Choice, Vol. ... Read more

Goodreads reviews for Fundamental Aspects of Plasma Chemical Physics


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